| 大幅面光刻胶板的显影工艺与终点控制技术 |
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| 引用本文： | 姜兆华,张伟,王尧,吴滨,印伟峨.大幅面光刻胶板的显影工艺与终点控制技术[J].应用激光,2008,28(6). |
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| 作者姓名： | 姜兆华 张伟 王尧 吴滨 印伟峨 |
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| 作者单位： | 上海市激光技术研究所,上海,200233;上海市激光束精细加工重点实验室,上海,200233 |
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| 基金项目： | 上海市科委应用技术开发项目
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| 摘 要： | 为了均匀显影大幅面激光全息光刻胶板,获得最佳衍射效果,使用自动喷淋显影工艺技术.文章讨论了显影方法及工艺对显影槽深均匀性的影响,包括激光的曝光能量,显影药液的浓度、温度、时间及胶板入液先后时间.通过多种显影方法比较,自动喷淋显影可以克服人工显影操作引起的时间、平稳性误差导致大幅面全息光刻胶母版显影不均匀、光栅槽型、终点控制和重复性差等缺陷,获得最佳显影效果.
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| 关 键 词： | 激光全息 光刻胶 自动显影 终点检测 全息设备 |
End-point Control and Development Process Techniques for Large Format Photoresist Plate |
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| Jiang Zhaohua,Zhang Wei,Wang Yao,Wu Bin,Yin Weie.End-point Control and Development Process Techniques for Large Format Photoresist Plate[J].Applied Laser,2008,28(6). |
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| Authors: | Jiang Zhaohua Zhang Wei Wang Yao Wu Bin Yin Weie |
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| Affiliation: | Jiang Zhaohua1,2,Zhang Wei1,Wang Yao1,Wu Bin1,Yin Weie1Shanghai Institute of Laser Technology,Shanghai 200233,China,2Shanghai Keylab of Laser Beam Micro-Processing |
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| Abstract: | To obtain optimized diffractive efficiency for uniform development process of Large Format Photoresist Plate while automatically spray development are used.The paper discuss development methods and techniques effect on grating groves uniform appearance of photoresist plate,include of exposure energy,concentration of developer solution,temperature,duration,different time when photoresist plate has been side by side immersion.Compare variety of development methods an automatic developing process will be enhan... |
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| Keywords: | Holography photoresist auto-development end-point Detection holographic equipment |
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