Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in2 |
| |
Authors: | Yang Joel K W Chen Yunjie Huang Tianli Duan Huigao Thiyagarajah Naganivetha Hui Hui Kim Leong Siang Huei Ng Vivian |
| |
Affiliation: | Institute of Materials Research and Engineering, A*STAR, Singapore. yangkwj@imre.a-star.edu.sg |
| |
Abstract: | We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in(2) using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in(2), which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing. |
| |
Keywords: | |
本文献已被 PubMed 等数据库收录! |
|