| 碳纳米管薄膜的电泳沉积与场发射性能 |
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| 引用本文： | 秦玉香,胡明.碳纳米管薄膜的电泳沉积与场发射性能[J].电子元件与材料,2008,27(5):12-14. |
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| 作者姓名： | 秦玉香 胡明 |
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| 作者单位： | 天津大学,电子信息工程学院,天津,300072 |
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| 摘 要： | 采用电泳法在Si基片上沉积碳纳米管(CNTs)薄膜。研究了电泳极间距、电泳时间及电泳电压等对沉积的薄膜形貌结构与场发射性能的影响。SEM、高倍光学显微镜和场发射性能测试结果表明,保持阴阳极间距为2cm,在100V的直流电压下电泳2min所获得的CNTs薄膜均匀、连续、致密且具有最好的场发射性能,其开启电场强度仅为1.19V/μm,当外加电场强度为2.83V/μm时,所获得的最大发射电流密度可达14.23×10–3A/cm2。
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| 关 键 词： | 电子技术 碳纳米管薄膜 场发射 电泳沉积 |
| 文章编号： | 1001-2028(2008)05-0012-03 |
| 修稿时间： | 2008年1月7日 |
Electrophoretic deposition and field emission properties of carbon nanotubes thin films |
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| QIN Yu-xiang,HU Ming.Electrophoretic deposition and field emission properties of carbon nanotubes thin films[J].Electronic Components & Materials,2008,27(5):12-14. |
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| Authors: | QIN Yu-xiang HU Ming |
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| Affiliation: | QIN Yu-xiang,HU Ming (School of Electronic Information Engineering,Tianjin University,Tianjin 300072,China) |
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| Abstract: | The carbon nanotubes (CNTs) thin film was prepared on Si substrate by electrophoretic deposition (EPD) method. The effects on morphology structure and field emission properties of CNTs thin films by different EPD parameters, including deposition time, deposition voltage, electrode separation and resultant electric field were studied systematically. SEM optical microscope and field emission measurements reveal that the CNTs thin film electrophoretically deposited for 2 min at a deposition voltage of 100 V an... |
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| Keywords: | electron technology carbon nanotubes thin film field emission electrophoretic deposition |
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