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Effect of deposition power on structural and electrical properties of Al-doped ZnO films using pulsed direct-current magnetron sputtering with single cylindrical target
Authors:Beom-Ki Shin   Tae-Il Lee   Jyoti Prakash Kar   Min-Jung Lee   Kang-Il Park   Kyung-Jun Ahn   Keun-Young Yeom   Joong-Hwee Cho  Jae-Min Myoung  
Affiliation:a Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-Dong, Seodaemun-Gu, Seoul, Republic of Korea;b Department of Materials Science and Engineering, Sungkyunkwan University, 300 Chunchun-Dong, Jangan-Gu, Suwon, Republic of Korea;c Department of Multimedia-System Engineering, University of Incheon, 12-1 Songdo-Dong, Yeonsu-Gu, Incheon, Republic of Korea
Abstract:
Keywords:Al-doped ZnO   Pulsed dc magnetron sputtering   Cylindrical target   Deposition rate   Structural and electrical properties
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