Plasma-etched organic layers for antireflection purposes |
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| Authors: | Schulz Ulrike Präfke Christiane Gödeker Christoph Kaiser Norbert Tünnermann Andreas |
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| Affiliation: | Fraunhofer-Institute for Applied Optics and Precision Engineering, Jena, Germany. ulrike.schulz@iof.fraunhofer.de |
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| Abstract: | Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks. |
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