Polarization filters with an autocloned symmetric structure

The process of fabricating photonic crystals comprised of alternately stacked high- and low-index dielectric materials on periodic substrates to form zigzag films is called the autocloning technique. In this study, we have fabricated TiO2/SiO2 two-dimensional polarization filters by using electron beam gun evaporation with ion-beam-assisted deposition. The shape of the zigzag structure is preserved, and the total thickness is 8?μm. The symmetric structural design can be utilized as an antireflection coating applied to reduce ripples and achieve a 200?nm working wavelength range.