Effective Doping in Cubic Si3N4 and Ge3N4: A First-Principles Study

First-principles calculations have been conducted to investigate impurities in cubic Si₃N₄ and Ge₃N₄. Impurity species suitable for n - and p -type doping are suggested, in terms of the formation and ionization energies. The suggested species are P and O as n -type dopants and Al as a p -type dopant for c -Si₃N₄, and Sb and O as n -type dopants and Al as a p -type dopant for c -Ge₃N₄. The dependence of the formation energies on the chemical potentials indicates that a proper choice of growth conditions is mandatory for suppressing the incorporation of these impurities into anti and interstitial sites, where the impurities can be charged to compensate carriers.