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基于65 nm CMOS工艺的2阶温度补偿全CMOS电压基准源
引用本文:杨晗,侯晨琛,钟泽,谢家志,廖书丹.基于65 nm CMOS工艺的2阶温度补偿全CMOS电压基准源[J].微电子学,2021,51(1):1-4.
作者姓名:杨晗  侯晨琛  钟泽  谢家志  廖书丹
作者单位:中国电子科技集团公司 第二十四研究所, 重庆 400060
基金项目:模拟集成电路国家重点实验室基金资助项目(6142802011503)
摘    要:采用65 nm CMOS工艺,设计了一种基于MOS亚阈区特性的全CMOS结构电压基准源.首先利用工作在亚阈值区NMOS管的栅源电压间的差值得到具有特定2阶温度特性的CTAT电压,该CTAT电压的2阶温度特性与PTAT电压2阶温度特性的弯曲方向相反.再通过电流镜技术实现CTAT电压和PTAT电压求和,最终得到具有2阶温度...

关 键 词:65  nm  CMOS工艺  亚阈区  电流镜技术  2阶温度补偿
收稿时间:2020/6/3 0:00:00

A CMOS Voltage Reference with Second-Order Temperature Compensation Based on 65 nm CMOS Process
YANG Han,HOU Chenchen,ZHONG Ze,XIE Jiazhi,LIAO Shudan.A CMOS Voltage Reference with Second-Order Temperature Compensation Based on 65 nm CMOS Process[J].Microelectronics,2021,51(1):1-4.
Authors:YANG Han  HOU Chenchen  ZHONG Ze  XIE Jiazhi  LIAO Shudan
Affiliation:The 24th Research Institute of China Electronics Technology Group Corp., Chongqing 400060, P. R. China
Abstract:Based on a 65 nm CMOS process, a subthreshold MOSFET voltage reference with second-order temperature compensation was designed. The reference generator utilized gate-source voltage difference for CTAT voltage between two NMOS transistors, which both operated in subthreshold region to achieve second-order temperature characteristics. The second-order temperature characteristics of CTAT voltage was opposite to the second-order temperature characteristics of PTAT voltage. By using current mirror technology, the gate-source voltage difference that was complementary to absolute temperature was added to the output of the voltage reference. Simulation results showed that a temperature coefficient of 5.9 ×10-6/℃ at 1.2 V was achieved from-55 ℃ to 160 ℃. The reference generator operated under supply voltage ranging from 1.1 V to 1.5 V with an output voltage of 273.5 mV and a power consumption of 10 μW.
Keywords:65 nm CMOS process  subthreshold region  current mirror technology  second-order temperature compensation
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