Diamond like carbon coatings deposited by microwave plasma CVD: XPS and ellipsometric studies

Diamond-like carbon (DLC) films were deposited by microwave assisted chemical vapour deposition system using d.c. bias voltage ranging from −100 V to −300 V. These films were characterized by X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry techniques for estimating sp ³/sp ² ratio. The sp ³/sp ² ratio obtained by XPS is found to have an opposite trend to that obtained by spectroscopic ellipsometry. These results are explained using sub-plantation picture of DLC growth. Our results clearly indicate that the film is composed of two different layers, having entirely different properties in terms of void percentage and sp ³/sp ² ratio. The upper layer is relatively thinner as compared to the bottom layer.