Transition behavior of PS-b-PMMA films on the balanced interfacial interactions |
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Authors: | Eunhye Kim Rui Guo Craig J. Hawker |
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Affiliation: | a Department of Chemical and Biomolecular Engineering, Yonsei University, Seoul 120-749, Republic of Korea b Material Research Laboratory and Departments of Materials, Chemistry and Biochemistry, University of California, Santa Barbara, CA 93016, United States c Department of Polymer Science & Engineering, University of Massachusetts, Amherst, MA 01003, United States |
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Abstract: | The thickness dependence of the order-to-disorder transition (ODT), measured by in situ grazing-incidence small-angle X-ray scattering (GISAXS), has been investigated in thin films of a symmetric polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) on a random copolymer (P(S-r-MMA)) grafted to the substrate where the interfacial interactions are balanced. With decreasing film thickness less than 25L0, the ODT significantly decreases to 193 °C for film of 10L0 in thickness, because the interfacial interactions by a random copolymer grafted to the substrate provide a surface-induced compatibilization toward two block components. However, a plateau of the ODT at ∼213 °C for films thicker than 25L0 was observed above the bulk value of 200 °C. The elevation of this ODT indicates a suppression of compositional fluctuations normal to the film surface, more than likely because the dominant orientation of the lamellar microdomains was found to be parallel to the film surface. |
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Keywords: | Block copolymers Thin film Transition behavior |
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