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玻璃表面化学镀纳米铜膜
引用本文:张会平,江中浩,刘先黎,连建设,侯旭峰,李光玉. 玻璃表面化学镀纳米铜膜[J]. 吉林大学学报(工学版), 2007, 37(1): 11-16
作者姓名:张会平  江中浩  刘先黎  连建设  侯旭峰  李光玉
作者单位:1. 吉林大学,汽车材料教育部重点实验室,长春,130022
2. 吉林北方彩晶数码电子有限公司,长春,130033
基金项目:国家重点基础研究发展计划(973计划) , 面向21世纪教育振兴行动计划(985计划) , 吉林大学校科研和教改项目
摘    要:利用化学镀铜工艺,以十二烷基苯磺酸钠(SDBS)作为镀液添加剂,在未经刻蚀的玻璃表面制备了纳米铜膜。采用FESEM、SEM和XRD等技术对铜膜表面、断面形貌及晶体结构进行了表征。结果表明,铜膜内团簇尺寸非常细小,晶粒尺寸约为15.5~28.3 nm,且存在较强的〈111〉织构。采用四探针法测量铜膜的电阻率,并讨论了电阻率随沉积时间增加而逐渐下降的原因。

关 键 词:材料表面与界面  化学镀  纳米铜膜  电阻率  玻璃基体
文章编号:1671-5497(2007)01-0011-06
收稿时间:2006-02-15
修稿时间:2006-02-15

Electroless plating nanocrystalline Cu film on glass substrate
Zhang Hui-ping,Jiang Zhong-hao,Liu Xian-li,Lian Jian-she,Hou Xu-feng,Li Guang-yu. Electroless plating nanocrystalline Cu film on glass substrate[J]. Journal of Jilin University:Eng and Technol Ed, 2007, 37(1): 11-16
Authors:Zhang Hui-ping  Jiang Zhong-hao  Liu Xian-li  Lian Jian-she  Hou Xu-feng  Li Guang-yu
Affiliation:1. Key Laboratory of Automobile Materials, Ministry of Education, Jilin University, Changchun 130022, China ; 2. Jilin Bei fang Caijing Digital Electronics Co. ,Ltd, Changchun 130033, China
Abstract:Nanocrystalline Cu films were prepared on an unetched glass substrate by an electroless plating technique with using Sodium Dodecyl Benzene Sulfonate(SDBS) as an additive in the bath.The morphologies of surface and cross-section and crystalline structure were characterized by FESEM,SEM and XRD.Experimental results show that the nodules in the Cu films are pretty fine, the grain size ranges from 15.5 nm to 28.3 nm,and an enhanced 〈111〉 texture existes in the Cu films.The resistivity of the Cu films was examined by four-point probe method.The reason that the resistivity of the Cu films decreases with the increase of the deposition time was discussed.
Keywords:surface and interface of materials  electroless plating  nanocrystalline Cu film  resistivity  glass substrate
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