Soft magnetic properties of NiFeTa thin films for biasing film applications in magnetoresistive elements |
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Authors: | Masahiro Kitada Kazuhiro Yamamoto |
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Affiliation: | (1) Central Research Laboratory, Hitachi Ltd, Kokubunji, 185 Tokyo, Japan;(2) Present address: Department of Material Science and Engineering, Waseda University, Room 59-326, 3-4-1, Ohkubo, 160 Shinjuku-ku, Tokyo, Japan |
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Abstract: | The effects of Ta addition on the magnetic properties of permalloy thin films have been investigated. The alloy compositions on a weight basis are (Ni81Fe19)1-x
Ta
x
with 0 x 0.105, and the films are sputtered onto a glass substrate at between room temperature and 300 C. The saturation magnetization and anisotropic magnetic field decrease with increasing Ta content. The saturation magnetization is 0.75 T at 5 wt % Ta. The coercivity remains constant at 125 Am-1. The electrical resistivity increases linearly with increasing Ta content, then saturates at approximately 7.5 wt% Ta. The saturation resistivity is approximately 1.00 ![Mgr](/content/g59u65u1p3883648/xxlarge924.gif) m. The magnetoresistivity ratio (![delta](/content/g59u65u1p3883648/xxlarge948.gif) / ) decreases with increasing Ta content, mainly due to increased electrical resistivity ( ). The magnetostriction changes from negative to positive with increasing Ta content and reaches nearly zero at 2 wt% Ta. The NiFeTa films containing 5–6 wt% Ta have potential for use as the soft-biasing film in magnetoresistive elements. |
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