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Soft magnetic properties of NiFeTa thin films for biasing film applications in magnetoresistive elements
Authors:Masahiro Kitada  Kazuhiro Yamamoto
Affiliation:(1) Central Research Laboratory, Hitachi Ltd, Kokubunji, 185 Tokyo, Japan;(2) Present address: Department of Material Science and Engineering, Waseda University, Room 59-326, 3-4-1, Ohkubo, 160 Shinjuku-ku, Tokyo, Japan
Abstract:The effects of Ta addition on the magnetic properties of permalloy thin films have been investigated. The alloy compositions on a weight basis are (Ni81Fe19)1-x Ta x with 0 les x les 0.105, and the films are sputtered onto a glass substrate at between room temperature and 300 DaggerC. The saturation magnetization and anisotropic magnetic field decrease with increasing Ta content. The saturation magnetization is 0.75 T at 5 wt % Ta. The coercivity remains constant at 125 Am-1. The electrical resistivity increases linearly with increasing Ta content, then saturates at approximately 7.5 wt% Ta. The saturation resistivity is approximately 1.00 MgrOHgrm. The magnetoresistivity ratio (deltarhov/rhov) decreases with increasing Ta content, mainly due to increased electrical resistivity (rhov). The magnetostriction changes from negative to positive with increasing Ta content and reaches nearly zero at 2 wt% Ta. The NiFeTa films containing 5–6 wt% Ta have potential for use as the soft-biasing film in magnetoresistive elements.
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