Size Dependence of Microstructure Characteristics for Chromium Disilicide Thin Films

We have used computer analysis to study linear and bulk characteristics of the microstructure of CrSi₂ thin films consisting of crystalline and amorphous phases; we used transmission electron microscopy to determine the microstructure of the films. As the film thickness increases, the linear dimensions of the crystallites and their volume fraction increase, while the average interparticle distance and the specific number of particles decrease. In this case, the microstructure evolves from a matrix type to a matrix-statistical type. It is due to phenomena including recrystallization during film deposition, coalescence of discrete islands of crystallites, and «sintering» of contacting particles.