等离子体浸没离子注入及表面强化工艺的进展

等离子体浸没离子注入 (PIII)消除了传统束线离子注入 (IBII)固有的视线限制 ,是一种更适合于处理复杂形状工件的手段 .近十年来 ,PIII及其工业应用在国内外得到了迅速发展 .然而 ,随着PIII的研究与开发的深入 ,发现仍有若干重要的物理与技术问题 ,诸如浅的注入层、离子注入不均匀性、气体 (氮 )等离子体的有限应用范围等等 ,阻碍了PIII工业应用的发展 .目前 ,这些问题已成为国内外学者关注的焦点 .我实验室近年来在注入过程鞘层动力学的计算机理论模拟、离子注入剂量不均匀性改善、圆筒内表面注入研究、新型长射程阴极弧金属等离子体源研制、气体及金属等离子体的综合性表面改性工艺研究、以及低能高温PIII新工艺研究等方面进行了研究工作 .

Development of plasma immersion ion implantation and surface strengthening technique

Plasma immersion ion implantation (PIII) circumvents the line of sight restriction inherent to conventional ion implantation (IBII), is a more suitable method for treatment of complex shaped workpieces. The PIII and its applications are rapidly developed in surface modification of advanced materials in the world in recent ten year. However, on the basis of R&D of PIII, it was still discovered that there were a number of important physical and technical problems, such as thin implantation layer, ion implantation dose non uniformity, limited application fields of gaseous (nitrogen) plasma, etc., which obstruct development of PIII industrial applications. Now, these problems are deeply concerned by researchers in the world. In this paper, computer theory simulation for the sheath dynamics in the implantation process, improvement of ion implantation dose non uniformity, study of inner surface ion implantation of cylinders, development of new, long range cathodic arc metal plasma sources, study of synthetic surface modification techniques of gas and metal plasmas as well as study of new technique of low energy, high temperature plasma immersion ion implantation carried on in our laboratory in recent years are described.