Nano–level finishing of single crystal silicon blank using magnetorheological finishing process |
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| Affiliation: | 1. Graduate School, Akita Prefectural University, 84-4 Tsuchiya-ebinokuchi, Yurihonjo, Akita 0150055, Japan;2. Department of Machine Intelligence & Systems Engineering, Akita Prefectural University, 84-4 Tsuchiya-ebinokuchi, Yurihonjo, Akita 0150055, Japan;3. School of Aeronautics and Manufacturing Engineering, Nanchang Hangkong University, 696 Fenghe South Avenue, Nanchang, Jiangxi 330063, China;1. Department of Mechanical Engineering, University College of Engineering, Osmania University, Hyderabad 500 007, India;2. Department of Mechanical Engineering, Indian Institute of Technology Delhi, New Delhi 110 016, India;1. Precision Engineering Division, Bhabha Atomic Research Centre, Mumbai, 400085, India;2. Department of Mechanical Engineering, Indian Institute of Technology, Kanpur, 208016, India;1. Indian Oil Corporation of India Ltd, New Delhi, India;2. Mechanical Engineering Department, Indian Institute of Technology Kanpur, India;3. Mechanical Engineering Department, Indian Institute of Technology Kharagpur, India |
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| Abstract: | Magnetorheological finishing (MRF) utilizes magnetorheological (MR) fluid, which consists of magnetic particles, nonmagnetic abrasives, and some additives in water or other carrier to polish the materials. An experimental study is conducted to predict the effect of process parameters (concentration of magnetic particles and abrasive particles, carrier wheel speed, and initial surface roughness) on surface finish and material removal rate in MRF of single crystal silicon blank. The final surface roughness value in terms of arithmetical mean roughness (Ra) obtained is as low as 8 nm from the initial value of 1300 nm. An optimization study is also carried out to find optimum values of process parameters from the selected range. |
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