Effect of the etching time on the morphological, optical and electronic properties of silicon nanowires

ABSTRACT: Owing to their interesting electronic, mechanical, optical and transport properties, silicon nanowires (SiNWs) have attracted much attention, giving opportunities to several potential applications in nanoscale electronic, optoelectronic devices and silicon solar cells. For photovoltaic (PV) application, a superficial film of SiNWs could be used as an efficient antireflection coating (ARC). In this work, we investigate the morphological, optical and electronic properties of SiNWs fabricated at different etching time. Characterizations of the formed SiNWs films were performed using a Scanning Electron Microscope (SEM), UV-Vis-NIR spectrophotometer and Light-Beam-Induced-Current (LBIC) technique. The later technique was used to determine the effective diffusion length in SiNWs films. From LBIC investigations, we deduce that the homogeneity of the SiNWs film play a key role on the electronic properties.