磁控溅射Ti掺杂NbN薄膜的机械和摩擦学特性研究

为研究Ti掺杂的NbN薄膜的机械和摩擦学特性,采用射频和直流磁控共溅射技术制备了Ti掺杂的NbN(Ti:NbN)薄膜.利用X射线衍射仪(XRD)、能量色散X射线光谱仪(EDX)、扫描电子显微镜(SEM)、纳米压痕仪、高温摩擦磨损实验机分别对Ti掺杂的NbN薄膜的微观结构、组成成分、表面形貌、机械和摩擦学性能进行了研究.XRD测试结果显示,薄膜的结晶性随着Ti靶掺杂功率的增加(从0 W逐渐升高到40 W)而呈明显增强趋势,晶粒尺寸也由18.010 nm增加到21.227 nm.当Ti靶的掺杂功率为30 W时,NbN薄膜的硬度由4.5 GPa(未掺杂)增加到20.4 GPa,弹性模量由145.8 GPa(未掺杂)增加到224.5 GPa; 当Ti靶的掺杂功率为40 W时,NbN薄膜的摩擦系数由0.73(未掺杂)下降到0.51,磨损率由3.3×10^-6 mm³/(N·mm)(未掺杂)下降到2.1×10^-6 mm³/(N·mm).这表明,掺杂Ti可使NbN薄膜的机械性能和摩擦学性能得到很大的改善.

Study on the mechanical and tribological properties of Ti-doped NbN films deposited by magnetron sputtering

In order to study the mechanical and tribological properties of Ti-doped NbN films, Ti-doped NbN(Ti:NbN)films were prepared by RF and DC magnetron co-sputtering. The structure, composition, surface morphology, mechanical and tribological properties were studied by X -ray diffractomer(XRD), energy dispersive X -ray spectrometer(EDX), scanning electron microscopy(SEM), nanoindentation and high temperature friction and wear testing machine, respectively. XRD results show that the crystallinity of the film increases significantly with increasing Ti target doping power(gradually increasing from 0 W to 40 W), and the grain size increases from 18.010 nm to 21.227 nm. When the doping power of Ti target is 30 W, the hardness of NbN films increased from 4.5 GPa(undoped)to 20.4 GPa, and the elastic modulus from 145.8 GPa(undoped)to 224.5 GPa. And when the doping power of Ti target is 40 W, the friction coefficient of NbN thin films decreases from 0.73(undoped)to 0.51, and the wear rate from 3.3×10^-6 mm³/(N·mm)(undoped)to 2.1×10^-6 mm³/(N·mm). The results show that the mechanical and tribological properties of NbN thin films can be greatly improved by doping metal Ti.