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基于SU-8的微透镜阵列的设计和制作
引用本文:刘建林,张斌珍,崔敏,张剑,季长红.基于SU-8的微透镜阵列的设计和制作[J].微纳电子技术,2012,49(3):187-191.
作者姓名:刘建林  张斌珍  崔敏  张剑  季长红
作者单位:中北大学电子测试技术重点实验室;中北大学仪器科学与动态测试教育部重点实验室,太原 030051
基金项目:国家自然科学基金面上资助项目(61176115)
摘    要:以SU-8作为结构材料,采用紫外光刻工艺,尤其以斜曝光工艺为主,加工出主光轴平行于衬底基片的微透镜阵列,单个微透镜的直径大约为500μm。初步确定出加工此透镜所需要的曝光剂量、前烘时间、后烘时间和显影时间,为加工其他尺寸的透镜提供参考。基于此方法加工的微透镜阵列能够对光束进行聚焦、反射、衍射、相位调制等控制,从而可最终实现光开关、衰减、扫描和成像等功能,为其他微型光学器件,如分光镜和反射镜等的系统集成提供极大的便利。同时,此微透镜阵列也会被集成在微流细胞仪中用来对流式细胞仪中样本流做荧光检测,极大地提高了检测的精度。

关 键 词:微透镜阵列  SU-  光刻工艺  斜曝光  系统集成

Design and Fabrication of the Micro Lens Array Based on SU- 8
Liu Jian-lin , Zhang Bin-zhen , Cui Min , Zhang Jian , Ji Chang-hong.Design and Fabrication of the Micro Lens Array Based on SU- 8[J].Micronanoelectronic Technology,2012,49(3):187-191.
Authors:Liu Jian-lin  Zhang Bin-zhen  Cui Min  Zhang Jian  Ji Chang-hong
Affiliation:a,b (a.Science and Technology on Electronic Test & Measurement Laboratory;b.Key Laboratory of Instrumentation Science & Dynamic Measurement of Ministry of Education,North University of China, Taiyuan 030051,China)
Abstract:Using SU-8 as a structural material,the micro lens arrays with the primary optical axis parallel to the substrate were processed by UV light lithography process,especially inclined exposure technology,and the diameter of a single micro lens is about 500 μm.The exposure do-sage,pre-baking time,post-baking time and development time for processing the lens were confirmed preliminarily,providing a reference for processing lens with different size.Micro lens arrays based on the processing method can obtain the focusing,reflection,diffraction,phase modulation and other control for the beam to finally realize functions such as photo switch,attenuation,sweep and image formation,providing convenient for other micro optical device integration,such as spectroscope and reflector.Meanwhile,the micro lens arrays can be integrated in the micro flow cytometry to make fluorescence detection of sample flow,which greatly improves the detection accuracy.
Keywords:micro lens array  SU-8  lithography process  tilt lithography  system integration
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