Enhanced photocatalytic activity of TiO2-ZnO thin films deposited by dc reactive magnetron sputtering |
| |
| Affiliation: | 1. Departamento de Física, Centro de Investigación y de Estudios Avanzados del I.P.N., A.P. 14-740, Ciudad de México 07360, México;2. Programa de Nanociencias y Nanotecnología, Centro de Investigación y de Estudios Avanzados del I.P.N., A.P. 14-740, Ciudad de México 07360, México;1. Department of Electronic Engineering, National Quemoy University, 1 Daxue Road, Jinning Township, Kinmen 89250, Taiwan, ROC;2. Center for General Education, National Taichung University of Science and Technology, 129 San-min Road, Section 3, Taichung 40401, Taiwan, ROC;3. Department of Applied English, National Quemoy University, Taiwan, ROC;4. Department of Computer Science and Information Engineering, National Quemoy University, Taiwan, ROC;1. Unité de physique des dispositifs à semi-conducteurs, Faculté des sciences de Tunis, Université de Tunis, El Manar, 2092 Tunis, Tunisia;2. Unité de Recherche de Physique des Matériaux Isolants et Semi-Isolants, Faculté des Sciences de Sfax, BP 1171, 3000 Sfax, Université de Sfax, Tunisia;3. Centre de Nanosciences et de Nanotechnologies- Campus Marcoussis (CNRS), Route de Nozay, 91460 Marcoussis, France;1. School of Basic and Applied Sciences, Guru Gobind Singh Indraprastha University, Dwarka, New Delhi 110078, India;2. Inter University Accelerator Centre, New Delhi 110067, India;3. CSIR- National Physical Laboratory, New Delhi 110012, India;1. Research Unit: Physics of Insulators and Semi Insulator Materials, Faculty of Science of Sfax, Road of Soukra Km 3.5, B.P: 1171 3038 Sfax, University of Sfax, Tunisia;2. Laboratory of « Eau, Energie et Environnement», National Engineering School of Sfax, B.P1173.W.3038, Sfax, University of Sfax, Tunisia;3. Research Unit: Physics of Semi-conductor Devices, Faculty of Science of Tunis, Tunis El Manar University, 2092, Tunis, Tunisia;4. University Lille North of France, ULCO, UDSMM, 59140, Dunkerque, France;5. University Lille North of France, ULCO, UDSMM, 62228, Calais, France |
| |
| Abstract: | The effect of deposition conditions on the photocatalytic activity of TiO2-ZnO thin films was studied. By using a (Ti)90-(Zn)10 alloy target, the samples were deposited at room temperature on glass substrates by dc reactive magnetron sputtering and post-annealed in air at 500 °C. The dependence of the physical properties of the films on the O2/Ar gas ratio and the deposition working pressure was investigated. XRD patterns showed mainly the formation of the anatase phase of TiO2. Optical absorption measurements exhibited a blue shift of the band-gap energy with increasing working pressure. XPS spectra indicated the presence of the Ti4+ and Zn2+ oxidation states, which correspond to TiO2 and ZnO, respectively. The chemical state of Ti was further analyzed by means of the modified Auger parameter, α’, which gave a value of ca. 873 eV. The photocatalytic property of the films was assessed by the degradation of a methylene blue aqueous solution. The maximum photocatalytic performance was observed for the samples deposited at 3.0 mTorr and O2/Ar gas ratio of 10/90. These results are explained in terms of the structural, optical, and morphological properties of the films. |
| |
| Keywords: | A Films B Spectroscopy E Photocatalysis |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
