Oxidation of Propylene Glycol Methyl Ether Acetate Using Ozone-Based Advanced Oxidation Processes |
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| Authors: | JJ Wu M Muruganandham LT Chang SH Chen |
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| Affiliation: | Department of Environmental Engineering and Science , Feng Chia University , Taichung, Taiwan |
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| Abstract: | The present study investigates the degradation of PGMEA and its TOC removal using O3, UV/O3, O3/H2O2, and UV/H2O2 processes under various experimental conditions. Ozonation of PGMEA was substantially enhanced in the presence of UV light and H2O2. Approximately 33% of TOC enhancement was noted in UV/O3 process over ozonation process. A linear relationship between PGMEA and H2O2 decomposition was observed in O3/H2O2 and UV/H2O2 processes. The influence of solution pH on the decomposition of PGMEA was investigated and found that basic medium was the most efficient in all AOPs. After 60 minutes 62.4%, 100%, 90% and 54% of PGMEA decomposition at pH 10.0 was observed in O3, UV/O3, O3/H2O2, and UV/H2O2 processes, respectively. It is concluded that UV/O3 process is a promising approach for the oxidation and removal of PGMEA. |
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| Keywords: | Ozone Propylene Glycol Methyl Ether Acetate Hydrogen Peroxide Ultraviolet Oxidation Advanced Oxidation Processes TOC Removal Semiconductor Technology |
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