| 我国超净高纯试剂市场需求及产业化前景 |
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| 引用本文： | 穆启道. 我国超净高纯试剂市场需求及产业化前景[J]. 精细与专用化学品, 2008, 16(23): 18-21 |
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| 作者姓名： | 穆启道 |
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| 作者单位： | 北京科华微电子材料有限公司,北京,101312 |
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| 摘 要： | 一微电子技术发展现状及趋势随着集成电路集成度的不断提高,电路的线宽越来越细。从第一个晶体管问世算起,半导体技术的发展已有多半个世纪了,现在它仍保持着强劲的发展态势,继续遵循Moore定律,即芯片集成度18个月翻一番.每三年器件尺寸缩小0.7倍的速度在发展。特别是二十世纪九十年代末以来,集成电路制作技术的竞
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| 关 键 词： | 超净高纯试剂 产业化前景 市场需求 电路集成度 Moore定律 Roadmap 半导体技术 技术发展现状 |
Market Demand and Industrial Production Prospect of Ultra-clean Highly Pure Chemical Reagents in China |
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| MU Qi-dao. Market Demand and Industrial Production Prospect of Ultra-clean Highly Pure Chemical Reagents in China[J]. Fine and Specialty Chemicals, 2008, 16(23): 18-21 |
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| Authors: | MU Qi-dao |
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| Abstract: | This article introduced the development situation and the tendency of microelectronic technology at home and abroad.This paper focuses on development situation and the tendency of the ultra-clean highly pure chemical reagents at home and abroad,the demand and the supply situation of the ultra-clean highly pure chemical reagent were analyzed too.The main problems such as preparation technology,analysis and inspection,standardization technology,packaging technique,strict control of environmental protection and investment scale existed in the development of ultra-clean highly pure chemical reagent in China were analyzed as well. |
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| Keywords: | ultra-clean highly pure chemical reagent situation industrialization |
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