Tribological behavior of hafnium diboride thin films |
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Authors: | A. Chatterjee J.E. Gerbi J.R. Abelson P. Bellon J.P. Chevalier |
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Affiliation: | a Department of Materials Science and Engineering, University of Illinois at Urbana Champaign, 1304 W. Green Street, Urbana, IL- 61801, USA b Department of Mechanical and Industrial Engineering, University of Illinois at Urbana Champaign, 1206 W. Green Street, Urbana, IL- 61801, USA c Centre d'Etudes de Chimie Métallurgique, 15, rue Georges Urbain, Vitry-sur-Seine 94407, France |
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Abstract: | Transition metal diborides and their coatings offer an excellent combination of high hardness, high chemical stability and high thermal conductivity, thus they are excellent candidates for a wide range of tribological applications. In this work, stoichiometric hafnium diboride films were grown by chemical vapor deposition from a single-source, heteroatom-free precursor Hf(BH4)4 under conditions that afford highly conformal and smooth films. HfB2 films of thickness ∼ 0.6 μm deposited on steel substrates were subjected to pin-on-disk wear testing against a counter face disc of AISI 440C martensitic stainless steel. Based on wear measurements, both as-deposited (X-ray amorphous) and annealed (nanocrystalline) samples showed very high wear resistance compared to uncoated samples. For the annealed samples, SEM analysis indicated the formation of a wear resistant composite body in the wear scar, even at depths far exceeding the film thickness, which appears to dramatically improve wear resistance. No mild-to-severe wear transition was observed which indicates that mild wear occurred throughout the wear test. This ensemble of results, when considered in the light of high contact pressures (∼ 700 MPa) used in the study, makes the HfB2 material potentially attractive for wear-resistant applications. |
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Keywords: | Hafnium diboride Pin-on-disk test Chemical vapor deposition |
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