Influence of bias voltage on morphology and structure of MgO thin films prepared by cathodic vacuum arc deposition |
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Authors: | Daoyun Zhu Yi Liu Zhenhui He Lishi Wen S.P. Wong |
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Affiliation: | a State Key Laboratory of Optoelectronic Materials and Technologies, and Physics department of School of Physics and Engineering, Sun Yat-sen University, Guangzhou 510275, PR China b Department of Electronic Engineering and Materials Technology Research Centre, The Chinese University of Hong Kong, Shatin N.T., Hong Kong |
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Abstract: | MgO thin films with high optical transmittance were prepared by cathodic vacuum arc deposition technique. Rutherford backscattering spectroscopy, atomic force microscopy and X-ray diffraction were used to investigate the influences of the negative pulse bias voltage on the composition, the morphology and the crystal structure of MgO thin films, respectively. AFM images show that the grain growth is influenced by high energy ions under bias voltage and that the grains deposited at the pulse bias voltage with set value of |Vp| = 600 V stack densely and look the largest as compared to those prepared at different set Vp. The RBS spectra indicate that the Mg/O ratio is about 0.95-1.00 in MgO thin films which is nearly the stoichiometric composition of bulk MgO. The Mg/O ratio increases with set |Vp| until |Vp| is 450 V, and then keeps almost unchanged with set |Vp| up to 750 V. The MgO thin films have a combined orientation of (100) and (110). Below − 150 V, the (100) orientation is predominant and the intensity ratio of I220/I200 increases with set |Vp|. |
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Keywords: | 81.15.Jj |
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