Comparative protective abilities of organothiols SAM coatings applied to copper dissolution in aqueous environments |
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Authors: | F Sinapi J Delhalle |
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Affiliation: | a Fonds pour la Formation à la Recherche dans l’Industrie et dans l’Agriculture, Rue d’Egmont 5, B-1000 Bruxelles, Belgium b Laboratoire de Chimie et d’Electrochimie des Surfaces, Facultés Universitaires Notre-Dame de la Paix, Rue de Bruxelles 61, B-5000 Namur, Belgium |
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Abstract: | Self-assembled monolayers (SAMs) obtained by adsorption of n-organothiols molecules have been formed onto polycrystalline copper surfaces in order to build up barrier films protecting copper from oxidation. In this context, formation of n-dodecanethiol (DT), (3-mercaptopropyl)trimethoxysilane (MPTS) and 11-perfluorobutylundecanethiol (F4H11) monolayers has been elaborated on copper and evaluated by X-ray photoelectron spectroscopy while polarization and cyclic voltammetry curves were used to compare the inhibition efficiency of the three organic coatings. Furthermore, atomic absorption spectrometry measurements were carried out in domestic water and in NaCl 0.5 M solutions in order to evaluate and quantify the dissolution of copper electrodes before and after protection. Results showed evidences that, among the three organic compounds assessed, F4H11 is the most suitable candidate to slow down the copper oxidation process. |
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Keywords: | Polycrystalline copper n-Organothiol Self-assembled monolayer Electrochemistry X-ray photoelectron spectroscopy (XPS) Atomic absorption spectrometry (AAS) |
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