| ZrO_2膜中的应力 |
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| 引用本文： | 夏风,钱晓良,刘光葵,孙尧卿.ZrO_2膜中的应力[J].中国陶瓷,2000(2). |
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| 作者姓名： | 夏风 钱晓良 刘光葵 孙尧卿 |
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| 作者单位： | 华中理工大学材料科学及工程学院!武汉430074 |
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| 摘 要： | 用射频溅射制备了ZrO2 膜 ,发现膜呈压应力剥落 ,用X射线衍射分析了薄膜中的应力 ,提出了避免剥落的对策。
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| 关 键 词： | 薄膜 ZrO_2 基片 应力 |
STRESS IN ZrO_2 FILMS |
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| XIA Feng,QIAN Xiaoliang,LIU Guangkui,SUN Yaoqing.STRESS IN ZrO_2 FILMS[J].China Ceramics,2000(2). |
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| Authors: | XIA Feng QIAN Xiaoliang LIU Guangkui SUN Yaoqing |
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| Abstract: | ZrO_2films were deposited with rf sputteringX-ray diffraction method was used for analyzing the stress in the films,which could explain why the films peel off.A strategy for avoiding peeling was proposed. |
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| Keywords: | thin film ZrO_2 substrate stress |
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