Progress in deep-UV photoresists |
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| Authors: | P. B. Sahoo R. Vyas M. Wadhwa S. Verma |
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| Affiliation: | (1) Semiconductor Complex Limited, Industrial Area Phase-8, 160 059 Mohali, India |
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| Abstract: | Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the recent development and challenges of deep-UV photoresists and their processing technology. |
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| Keywords: | Photoresists DUV lithography chemically amplified (CA) resist top surface imaging |
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