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超细Co/Cu纳米多层膜磁性研究
引用本文:贾利云,许佳玲,刘超,曲蛟,侯登录,李秀玲.超细Co/Cu纳米多层膜磁性研究[J].微纳电子技术,2012(10):654-657,687.
作者姓名:贾利云  许佳玲  刘超  曲蛟  侯登录  李秀玲
作者单位:河北建筑工程学院数理系;河北师范大学信息与物理科学学院
基金项目:国家自然科学基金资助项目(10774037);河北省科技厅科技攻关计划项目(07215105);张家口市科学技术研究与发展指导项目(0921036B)
摘    要:利用磁控溅射方法制备了纳米Co/Cu多层膜。利用扫描探针显微镜(SPM)观测了其表面形貌和磁畴结构,并通过振动样品磁强计(VSM)测量了磁性。结果表明,薄膜的微结构和磁性随非磁性层厚度的变化有着非常显著的变化。超细Co颗粒构造的多层膜样品,颗粒尺寸逐渐增大,磁畴尺寸先减小后增大,最后发生明显的聚集。磁性金属和非磁性金属的比例对多层膜之间的交换耦合相互作用有显著影响。平行膜面方向上的饱和场明显小于垂直膜面方向。当体积比约为1∶80时,平行膜面方向饱和场为95.9 kA/m,垂直方向饱和场为328.1 kA/m。此时两个方向上的饱和场、剩磁、矫顽力和磁滞损耗均为最小值。

关 键 词:Co/Cu  多层膜  磁控溅射  饱和场  磁性

Magnetic Properties Research of Ultra Fine Co/Cu Nano-Multilayer Films
Jia Liyun,Xu Jialing,Liu Chao,Qu Jiao,Hou Denglu,Li Xiuling.Magnetic Properties Research of Ultra Fine Co/Cu Nano-Multilayer Films[J].Micronanoelectronic Technology,2012(10):654-657,687.
Authors:Jia Liyun  Xu Jialing  Liu Chao  Qu Jiao  Hou Denglu  Li Xiuling
Affiliation:1.Department of Mathematics and Physics,Hebei Institute of Architecture and Civil Engineering, Zhangjiakou 075024,China;2.College of Physics Science and Information Engineering,Hebei Normal University,Shijiazhuang 050024,China)
Abstract:Co/Cu multilayer films were fabricated by the DC magnetron sputtering method.The morphologies and magnetic domain structures were observed by the scanning probe microscope(SPM),and the magnetic properties were measured by the vibrating sample magnetometer(VSM).The result shows that the micro structure and magnetic properties of Co/Cu multilayer films depend strongly on the thickness of the Cu layer.For the multilayer film composed with the ultra fine Co particles,the particle size increases gradually,the domain size first decreases and then increases and finally the significant aggregation occurs.The proportion of the magnetic me-tal and non magnetic metal layer has a significant effect on the exchange coupling interaction.The saturation field in the parallel direction is obviously less than that in the vertical direction.When the volume ratio is about 1∶80,the saturation field parallel to the multilayer film surface direction is 95.9 kA/m,the saturation field in the vertical direction is 328.1 kA/m,and the minimal values of the saturation field,remanent magnetization,coercivity and hysteresis loss were obtained.
Keywords:Co/Cu  multilayer file  magnetron sputtering  saturation field  magnetic property
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