Characterisation of defects in very high deep-etch X-ray lithography microstructures

 In deep X-ray lithography synchrotron radiation is applied to pattern several hundred micrometer thick resist layers. This technique has been used to obtain micro structures with an aspect ratio up to 100 and dimensions in the micrometer range. The structures are characterised by straight walls and a typical sidewall roughness of approximately 50 nm. To be able to fabricate n-coherent structures with any lateral shape and to have the possibility to use these resist microstructures in an additional electroforming process the resist is usually mounted on a ceramic or metallic substrate. Due to the different thermal expansion coefficients of the resist material and the substrate a developing temperature of 37 °C produces cracks in the resist structures depending on the microstructure design. These defects are not observed if the developing temperature is reduced to 20 °C. Better structure quality is obtained using the GG-developer instead of MIBK/IPA, but the developing rate is decreased. Measurements of the developing rate of PMMA in GG-developer at different temperatures show that the contrast of the developer-resist system is increased at 20 °C compared to 37 °C. Received: 25 August 1997/Accepted: 3 September 1997