| 富氮层快速离子渗氮工艺及机理研究 |
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| 引用本文： | 韩莉,赵程.富氮层快速离子渗氮工艺及机理研究[J].材料热处理学报,2009,30(5). |
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| 作者姓名： | 韩莉 赵程 |
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| 作者单位： | 1. 青岛科技大学机电工程学院表面技术研究所,山东,青岛,266061;海军航空工程学院青岛分院航空机械系,山东,青岛,266041
2. 青岛科技大学机电工程学院表面技术研究所,山东,青岛,266061 |
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| 摘 要： | 利用正交试验法对活性屏快速离子渗氮工艺参数进行优化,并对正交试验预测的优化工艺参数进行了验证。利用Fick第二扩散定律对快速离子渗氮优化工艺的富氮层进行了氮浓度、氮浓度梯度的计算。试验及计算结果表明,高温渗氮温度、高温渗氮时间和低温渗氮时间对渗层厚度的影响较大,选择合适的参数可以在渗氮时间不变、渗层硬度不降低的前提下显著增加渗层厚度。当富氮层厚度为8μm时,采用快速渗氮技术得到试样内表面与基体之间的氮浓度梯度,为传统渗氮模式的20倍以上。
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| 关 键 词： | 正交试验 工艺优化 富氮层 氮浓度梯度 |
Study on nitrogen-rich layer fast plasma nitriding process and mechanism |
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| HAN Li,ZHAO Cheng.Study on nitrogen-rich layer fast plasma nitriding process and mechanism[J].Transactions of Materials and Heat Treatment,2009,30(5). |
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| Authors: | HAN Li ZHAO Cheng |
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| Affiliation: | 1;2;1.Surface Engineering Laboratory;College of Electromechanical Engineering;Qingdao University of Science and Technology;Qingdao 266061;China;2.Aviation Mechanical Engineering Department;Qingdao Branch;Navy Aeronautical Engineering Academy;Qingdao 266041;China |
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| Abstract: | The fast active screen plasma nitriding(ASPN) process with nitrogen-rich layer is a process of nitriding alternatively at temperatures higher and lower than eutectoid temperature of the nitriding steel.The nitriding parameters were optimial by means of orthogonal experiment.Nitrogen concentration and nitrogen concentration gradient in the nitrided layer of 40Cr steel nitrided under the optimized parameters was calculated based on Fick's Second Law.Results indicate that the thickness of the nitrided layer is... |
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| Keywords: | orthogonal experiment process optimizing nitrogen-rich layer nitrogen concentration gradient |
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