| 光敏纳米SiO2制备及在光致抗蚀材料中的应用 |
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| 引用本文： | 陈宁,杨林,张胜文,刘敬成,刘晓亚.光敏纳米SiO2制备及在光致抗蚀材料中的应用[J].高分子材料科学与工程,2012(2):72-75. |
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| 作者姓名： | 陈宁 杨林 张胜文 刘敬成 刘晓亚 |
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| 作者单位： | 江南大学化学与材料工程学院 |
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| 基金项目： | 国家自然科学基金资助项目(51003041) |
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| 摘 要： | 经溶胶-凝胶法制得纳米SiO2,用不同结构的双键硅烷偶联剂对其表面进行原位接枝改性,得到两种光敏纳米SiO2(M70SiO2和M50SiO2),并将其添加到紫外光固化丙烯酸酯预聚物中,制得杂化光致抗蚀材料。通过测定光敏参数(D0n.5)考察其光敏性知,杂化光致抗蚀材料光敏性明显增加,当光敏纳米SiO2的质量分数增至13.7%～15.8%时,光敏参数达25 mJ/cm2～27 mJ/cm2;用差示扫描量热仪(DSC)及热机械分析(TMA)考察抗蚀材料的热性能,结果显示,随光敏纳米SiO2用量增加Tg升高,热膨胀系数减小,同时分辨率和精密性并未因光敏纳米SiO2的加入而降低。
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| 关 键 词： | 光敏纳米SiO2 光致抗蚀材料 杂化 光能量敏感度 分辨率 |
Preparation and Application of Photosensitivity Nano-SiO2 |
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| Ning Chen,Lin Yang,Shengwen Zhang,Jingcheng Liu,Xiaoya Liu.Preparation and Application of Photosensitivity Nano-SiO2[J].Polymer Materials Science & Engineering,2012(2):72-75. |
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| Authors: | Ning Chen Lin Yang Shengwen Zhang Jingcheng Liu Xiaoya Liu |
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| Affiliation: | (School of Material and Chemistry,Jiangnan University,Wuxi 214122,China) |
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| Abstract: | Nano-SiO2 was prepared by sol-gel method,and photosensitivity nano-SiO2(M70SiO2 and M50SiO2) were obtained by in-situ grafting method using different silane coupling agents containing double bond.Then the hybrid photoresists were manufactured by incorporating photosensitivity nano-SiO2 into UV-curing acrylate prepolymer.The energy sensitivity was investigated by determining photosensitivity parameter(D0.5n),and the results show that the photoresists with M70SiO2 and M50SiO2 have excellent photosensitivity.Furthermore,thermal properties of the hybrid photoresists were investigated with differential scanning calorimetry(DSC) and thermomechanical analysis(TMA).Tg of cured films obviously increases,and the thermal expansion coefficient decreases.Meanwhile,the resolution and precision do not decrease due to the incorporation of M70SiO2 and M50SiO2. |
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| Keywords: | photosensitivity nano-SiO2 photoresist materials hybrid UV energy sensitivity resolution |
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