首页 | 本学科首页   官方微博 | 高级检索  
     


An analytical model for hot carrier degradation in nanoscale CMOS suitable for the simulation of degradation in analog IC applications
Authors:E. Maricau  P. De Wit  G. Gielen
Affiliation:1. State key Laboratory of Solidification Processing, Northwestern Polytechnical University, Xi''an 710072, China;2. IMDEA Materials, 28040 Madrid, Spain
Abstract:Channel hot carrier (CHC) degradation is one of the major reliability concerns for nanoscale transistors. To simulate the impact of CHC on analog circuits, a unified analytical model able to cope with various design and process parameters is proposed. In addition, our model can handle initial degradation and varying stress conditions, allowing the designer to estimate the impact of CHC on transistor performance for arbitrary stressing patterns. The model is experimentally verified in a 65 nm CMOS technology. Expressions to simulate the impact of transistor degradation on relevant transistor parameters like output conductance and threshold voltage degradation are presented and verified.
Keywords:
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号