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Microstructure and nanomechanical properties of Mn-rich Ni–Mn–Ga thin films
Affiliation:1. Smart Materials Lab, Thiagarajar College of Engineering, Madurai 625 015, India;2. Defence Metallurgical Research Laboratory, Hyderabad 500 058, India;3. Central Glass and Ceramic Research Institute, Kolkata 700 032, India;1. Department of Materials Science, Graduate School of Engineering, Tohoku University, Aoba-yama 6-6-02, Sendai 980-8579, Japan;2. Faculty of Engineering, Tohoku Gakuin University, Tagajo 985-8537, Japan;3. Research Institute for Engineering and Technology, Tohoku Gakuin University, Tagajo 985-8537, Japan;4. Faculty of Science and Technology, Ryukoku University, Otsu 520-2194, Japan;5. Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Sendai 980-8577, Japan;6. Graduate School of Science and Engineering, Yamagata University, Yonezawa 992-8510, Japan;1. Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), Northeastern University, Shenyang 110819, China;2. Laboratoire d’Étude des Microstructures et de Mécanique des Matériaux (LEM3), CNRS UMR 7239, Université de Lorraine, 57045 Metz, France;3. Laboratory of Excellence on Design of Alloy Metals for low-mAss Structures (DAMAS), Université de Lorraine, 57045 Metz, France;1. Center for Functionalized Magnetic Materials (FunMagMa), Immanuel Kant Baltic Federal University, 236041, Kaliningrad, Russian Federation;2. Dpto. de Física de Materiales, Fac. Químicas, UPV/EHU, 20018, San Sebastian, Spain;3. Dpto. de Física Aplicada, EUPDS, UPV/EHU, 200018, San Sebastian, Spain;4. IKERBASQUE, Basque Foundation for Science, 48011, Bilbao, Spain;5. National University of Science and Technology MISiS, 119049, Moscow, Russian Federation;1. Functional Nanomaterials Research Lab, Department of Physics, Indian Institute of Technology Roorkee, Uttarakhand 247667, India;2. Mechanical and Industrial Engineering Department, Indian Institute of Technology Roorkee, Uttarakhand 24667, India;1. Institute of Materials for Electronics and Magnetism – Consiglio Nazionale delle Ricerche, Parco Area delle Scienze 37/A, 43124 Parma, Italy;2. Department of Mathematical, Physical and Computer Sciences, University of Parma, Parco Area delle Scienze 7/A, 43124 Parma, Italy;3. Institute of Material Science, Technical University of Darmstadt, Alarich-Weiss-Str. 16, 64287 Darmstadt, Germany;4. Department of Chemistry, Life Sciences and Environmental Sustainability, University of Parma, Parco Area delle Scienze 17/A, 43124 Parma, Italy
Abstract:We report the effect of post-annealing on the crystalline phase, grain growth, magnetic and mechanical properties of Ni–Mn–Ga thin films deposited at room temperature followed by post-annealing at different temperatures. The phase and microstructural analysis reveal that amorphous to crystalline transformation occurs in as-deposited films after post-annealing above 873 K. The transformation of disordered phase into nanocrystalline phase by the influence of annealing has been confirmed by transmission electron microscopy. The crystalline films exhibit soft magnetic behavior with the Curie temperature of 314 K, while the amorphous films exhibit the Pauli-paramagnetic behavior even down to 4 K. The mechanical properties like hardness and elastic modulus of the films also show a strong dependence on the annealing temperature with crystalline film exhibiting maximum values of 6 GPa and 103 GPa, respectively. The Ni–Mn–Ga film annealed at 873 K exhibits enhanced nanomechanical properties and room temperature ferromagnetism which make this a potential candidate for use in MEMS devices.
Keywords:Ferromagnetic shape memory alloy  Thin film  Nanocrystalline structure  Microstructure  TEM  Nanoindentation
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