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利用保偏光纤马赫-曾德(MZ)干涉仪测量薄膜材料电光系数
引用本文:屠晓光,赵雷,陈平,陈少武,左玉华,余金中,王启明. 利用保偏光纤马赫-曾德(MZ)干涉仪测量薄膜材料电光系数[J]. 半导体学报, 2007, 28(7): 1012-1016
作者姓名:屠晓光  赵雷  陈平  陈少武  左玉华  余金中  王启明
作者单位:中国科学院半导体研究所,集成光电子国家重点实验室,北京,100083;中国科学院半导体研究所,集成光电子国家重点实验室,北京,100083;中国科学院半导体研究所,集成光电子国家重点实验室,北京,100083;中国科学院半导体研究所,集成光电子国家重点实验室,北京,100083;中国科学院半导体研究所,集成光电子国家重点实验室,北京,100083;中国科学院半导体研究所,集成光电子国家重点实验室,北京,100083;中国科学院半导体研究所,集成光电子国家重点实验室,北京,100083
基金项目:国家重点基础研究发展计划(973计划) , 国家自然科学基金
摘    要:利用保偏光纤MZ干涉仪测量了光学各向异性薄膜材料的电光效应.与传统MZ干涉仪相比,该干涉仪中所有的部件都采用保偏光纤进行连接.光源采用一个偏振输出最大功率为10mW的DFB激光器,用以得到高的信噪比.用该激光器测量超晶格材料的电光系数,同时用GaAs,KTP和GaN材料作为对比材料.测量的电光系数和已有结果有较好的可比性.

关 键 词:电光效应  保偏光纤  MZ干涉仪
文章编号:0253-4177(2007)07-1012-05
收稿时间:2007-01-28
修稿时间:2007-01-28

Electro-Optical Effect Measurement of Thin-Film Material Using PM Fiber Mach-Zehnder Interferometer
Tu Xiaoguang,Zhao Lei,Chen Ping,Chen Shaowu,Zuo Yuhu,Yu Jinzhong and Wang Qiming. Electro-Optical Effect Measurement of Thin-Film Material Using PM Fiber Mach-Zehnder Interferometer[J]. Chinese Journal of Semiconductors, 2007, 28(7): 1012-1016
Authors:Tu Xiaoguang  Zhao Lei  Chen Ping  Chen Shaowu  Zuo Yuhu  Yu Jinzhong  Wang Qiming
Affiliation:State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China
Abstract:A polarization-maintaining (PM) fiber Mach-Zehnder (MZ) interferometer has been established to measure the EO effect of very thin film materials with optical anisotropy.Unlike a common MZ interferometer,all the components are connected via polarization-maintaining fibers.At the same time,a polarized DFB laser with a maximum power output of 10mW is adopted as the light source to induce a large extinction ratio.Here,we take it to determine the electro-optical coefficients of a very thin superlattice structure with GaAs,KTP,and GaN as comparative samples.The measured EO coefficients show good comparability with the others.
Keywords:electro-optic effect  polarization-maintaining fiber  Mach-Zehnder interferometer
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