| 影响电子束曝光机加工微细化的因素 |
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| 引用本文： | 王国荃 罗腾蛟. 影响电子束曝光机加工微细化的因素[J]. 微细加工技术, 1991, 0(2): 15-19 |
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| 作者姓名： | 王国荃 罗腾蛟 |
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| 作者单位： | 中国科学院上海冶金研究所 200050(王国荃，罗腾蛟，陈福余，李忠涛)，中国科学院上海冶金研究所 200050(徐志如) |
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| 摘 要： | 结合实际工作,分析、探讨了影响电子束曝光机加工微细化的因素。这些因素主要有:抗蚀剂材料、电子束本身、电子束曝光机控制线路、器件结构和电子束工艺等。在诸影响因素中,工艺的影响是目前一个较大且较主要的影响因素,其次是背散射电子束的影响,对后者,我们采用辅助曝光方法加以改善,效果良好。但对工艺等的影响因素的改善尚待继续研究、摸索。
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| 关 键 词： | 电子束曝光机 微细加工 |
FACTORS AFFECTING ELECTRON BEAM MICRO-LITHOGRAPHY |
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| Wang Guoquan,Luo Tengjiao,Cheng Fuyu,Li Zhongtao and Xu Zhiru. FACTORS AFFECTING ELECTRON BEAM MICRO-LITHOGRAPHY[J]. Microfabrication Technology, 1991, 0(2): 15-19 |
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| Authors: | Wang Guoquan Luo Tengjiao Cheng Fuyu Li Zhongtao Xu Zhiru |
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| Affiliation: | Shanghai institute of metallurgy academia sinica |
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| Abstract: | We study the factors which affect electron-beam micro lithography, combining with our practical work. The main factors are the resist material, the electron beam and control electonics of the electron-beam machine. In addition, the electron-beam process and the structure of devices are also the other two factors. The electron-beam process is a major factor, while the back scattered electrons which can be improved by bias exposure is the second one. |
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| Keywords: | Back scattered electrons Proximity effects Bias exposure |
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