射频磁控溅射法制备二硫化钼薄膜

用射频磁控溅射法在GCr15钢表面制得了MoS2薄膜。通过扫描电镜、摩擦磨损以及划痕试验仪研究了工艺参数对薄膜形貌和性能的影响。结果表明:采用射频溅射法,在功率200W、工作气压3Pa、时间2h条件下制备的MoS2薄膜性能最佳;沉积过程中沉积原子从衬底表面获得足够的扩散能量时薄膜按层状模式生长,扩散能量不足时薄膜按层岛复合模式生长;MoS2薄膜摩擦因数低,具有优良的摩擦学特性。

Deposition of MoS2 Films by Radio Frequency Magnetron Sputtering

MoS2 films on GCr15 steel were gained by radio frequency(RF)magnetron sputtering method.Influence of different process parameters on the surface morphology and properties of the films was studied with scanning electron microscopy,friction and wear tester and scratch tester.The results show that films prepared by RF magnetron sputtering at the power of 200 W,the pressure of 3 Pa and the time of 2 h have best properties.During the coating formation,MoS2 films are grown in Frank-Van der Merwe mode when there is enough diffusion energy on the surface,otherwise MoS2 films are grown in Stranski-Krastanov mode when diffusion energy is not enough.Furthermore,MoS2 films have low friction coefficient and good tribological properties.