| 多种因素对TiO_2薄膜折射率的影响 |
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| 引用本文： | 李云.多种因素对TiO_2薄膜折射率的影响[J].西安邮电学院学报,2008,13(5):155-157. |
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| 作者姓名： | 李云 |
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| 作者单位： | 西安邮电学院,应用数理系,陕西,西安,710121 |
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| 摘 要： | 用电子束蒸发法制备TiO2薄膜,详细研究了工艺参数和热处理对TiO2薄膜折射率的影响。得到镀制高折射率的氧化钛薄膜最佳工艺参数:基片温度200℃、真空度2×10-2Pa、沉积速率0.2nm/s。热处理可以提高TiO2薄膜折射率。
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| 关 键 词： | 电子束蒸发 TiO2薄膜 折射率 |
The influence of multi - factors to the refractive index of TiO2 film |
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| LI Yun.The influence of multi - factors to the refractive index of TiO2 film[J].Journal of Xi'an Institute of Posts and Telecommunications,2008,13(5):155-157. |
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| Authors: | LI Yun |
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| Affiliation: | LI Yun (Department of Applied Mathematics and Physics, Xian University of Post and Telecommunications, Xi＇an 710121, China) |
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| Abstract: | TiO2 thin films are prepared by electron beam evaporation. Then the influence of multi-factors to its refractive index of TiO2 film is researched, such as technologic conditions and annealing. Optimal technologic conditions are obtained, they are 200℃ substrate, 2×10^-2 Pa chamber vacuum and 0.2nm/s deposition rate,Annealing will increase the refractive index of TiO2 film. |
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| Keywords: | electron beam evaporation TiO2 film refractive index |
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