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Self-aligned p-channel MISFET with a low-temperature-grown GaAsgate insulator
Authors:Chen   C.L. Mahoney   L.J. Nichols   K.B. Brown   E.R. Gramstorff   B.F.
Affiliation:Lincoln Lab., MIT, Lexington, MA;
Abstract:A new p-channel GaAs metal-insulator-semiconductor field-effect transistor (MISFET) using low-temperature-grown (LTG) GaAs as the gate insulator is demonstrated. Neither the GaAs conducting channel nor the gate insulator was doped, and a Be self-aligned implant was used to lower the source and drain series resistance. For a MISFET with a 1.5-μm gate length, the transconductance is 22 mS/mm and the maximum drain current is 120 mA/mm obtained at -8 V of gate bias. The measured unity-current-gain cut-off frequency fT is 2.0 GHz
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