Preparation and annealing study of CrTaN coatings on WC-Co |
| |
Authors: | Yung-I Chen Yu-Ting Lin Li-Chun Chang Jyh-Wei Lee |
| |
Affiliation: | aInstitute of Materials Engineering, National Taiwan Ocean University, Keelung, Taiwan;bDepartment of Materials Engineering, Mingchi University of Technology, New Taipei, Taiwan;cCenter for Thin Film Technologies and Applications, Mingchi University of Technology, New Taipei, Taiwan |
| |
Abstract: | To prevent Co diffusion from cemented carbides at high working temperatures, we fabricated CrTaN coatings by reactive direct current magnetron co-sputtering onto 6 wt.% cobalt cemented carbide substrates, to form diffusion barrier layers. The nitrogen flow ratio, N2/(Ar + N2), during the sputtering process was set at 0.4. The deposition rates of CrTaN coatings varied from 23 to 27 nm/min. The CrTaN coatings crystallized into a columnar structure, without heating the substrates during the sputtering process and exhibited surface hardness and Young's modulus values of 16–27 and 211–383 GPa, respectively. The CrTaN coatings were annealed at 500 and 600 °C for 4 h in air to evaluate the oxidation resistance and diffusion barrier performance. We also investigated oxidation resistance of the CrTaN coatings under a 50 ppm O2–N2 atmosphere, to assess the fabricated layers effectiveness as a protective coating for glass molding dies. |
| |
Keywords: | CrTaN Diffusion barrier Oxidation Cemented carbide |
本文献已被 ScienceDirect 等数据库收录! |
|