活性屏离子渗氮技术的研究

在真空室内放置一个钢制网状圆筒，并与直流高压电的负极相接，在直流电场的作用下，通过气体离子对圆筒的轰击溅射，产生了一些纳米数量级的活性粒子，利用这些高活性的纳米粒子簇可以对放置在圆筒内的钢件表面进行渗氮处理。试验证明，这些活性粒子是中性的Fe4N粒子，被处理的工件既可以处于悬浮电位，也可以接地。活性屏离子渗氮可以获得和直流离子渗氮同样的处理效果，并解决了直流离子渗氮技术多年来一直存在的许多难以克服的问题。

An Investigation of Active Screen Plasma Nitriding

An steel cage was installed in a vacuum chamber of plasma nitriding apparatus and the entire workload is surrounded by the cage.A high voltage cathodic potential is applied on the cage.Therefore,it is on the active screen,rather than on the component surface that the plasma forms.Since plasma is not formed on the component surface,many problems associated with the conventional DC plasma nitriding can be eliminated.Experimental results show that the active screen plasma nitriding can achieve similar nitriding effect to that of DC plasma nitriding.And the clusters sputtered from the active screen are neutral Fe_4N particles.Therefore,the worktable and the parts to be treated can be placed in a floating potential or zero potential.