复合高功率脉冲磁控溅射技术的研究进展

高功率脉冲磁控溅射技术(HIPIMS)是一门新兴的高离化率磁控溅射技术.概述了HIPIMS的技术优势,包括高膜层致密度和平滑度、高膜基界面结合强度以及复杂形状工件表面膜层厚度均匀性好等.同时归纳了HIPIMS存在的问题,包括沉积速率及低溅射率金属靶材离化率低等.在此基础上,重点综述了近年来复合HIPIMS技术的研究进展,其中复合其他物理气相沉积技术的HIPIMS,包括复合直流磁控溅射增强HIPIMS、复合射频磁控溅射增强HIPIMS、复合中频磁控溅射增强HIPIMS、复合等离子体源离子注入与沉积增强HIPIMS等;增加辅助设备或装置的HIPIMS,包括增加感应耦合等离子体装置增强HIPIMS、增加电子回旋共振装置增强HIPIMS,以及增加外部磁场增强HIPIMS等.针对各种形式的复合HIPIMS技术,分别从复合HIPIMS技术的放电行为、离子输运特性,及制备膜层的结构与性能等方面进行了归纳.最后展望了复合HIPIMS技术的发展方向.

Research Progress of Hybrid High Power Impulse Magnetron Sputtering

High power impulse magnetron sputtering (HIPIMS) is a novel technique magnetron sputtering with high ionized fraction. The advantages of HIPIMS were summarized, including high film density and smoothness, high bonding strength of film-substrate interface and good thickness uniformity on the surface of complex shape workpiece. The problems of HIPIMS were also induced, including low deposition rate and the ionization rate of low sputtering rate metal target. On this basis, the paper reviewed the recent research progress of hybrid HIPIMS. The hybrid HIPIMS with physical vapor deposition technology included hybrid DC magnetron sputtering enhanced HIPIMS, hybrid radio frequency magnetron sputtering enhanced HIPIMS, hybrid medium frequency magnetron sputtering enhanced HIPIMS, and hybrid plasma ion implantation enhanced HIPIMS. The hybrid HIPIMS with auxiliary equipment or device included adding the inductively coupled plasma enhanced HIPIMS, adding the electron cyclotron resonance device enhanced HIPIMS and adding the external magnetic field enhanced HIPIMS. In view of various forms of hybrid HIPIMS technology, the discharge behavior, ion transport properties and the structure and properties of the film were summarized, respectively. Finally, the future development trend of hybrid HIPIMS technology was prospected.