| 熔融法制备高岭石/对甲基苯磺酸插层复合物 |
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| 引用本文： | 赵顺平,王涛,徐衡,郭玉. 熔融法制备高岭石/对甲基苯磺酸插层复合物[J]. 非金属矿, 2009, 32(4) |
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| 作者姓名： | 赵顺平 王涛 徐衡 郭玉 |
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| 作者单位： | 1. 安庆师范学院化学化工学院,安徽,安庆,246011;光、电、磁功能配合物和纳米配合物安徽省重点实验室,安徽,安庆,246011
2. 安庆师范学院物理与电气工程学院,安徽,安庆,246011 |
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| 基金项目： | 安徽教育厅自然科学研究项目 |
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| 摘 要： | 以高岭石/二甲基亚砜(K/DMSO)为前驱体,用熔融法制备了高岭石/对甲基苯磺酸(K/p-TSA)插层复合物,并用XRD、FI-IR、TG-DSC对插层复合物进行了表征.结果表明:反应12h时,K/p-TSA插层复合物出现1.014nm、1.088nm、1.263nm、1.378nm四个衍射峰,插层率为89.7%,p-TSA分子在高岭石层间主要采取单层倾斜相和双层平卧相,并且K/p-TSA插层复合物在112℃以下较稳定.
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| 关 键 词： | 高岭石 对甲基苯磺酸(p-TSA) 插层 熔融 |
Preparation of Kaolinite/p-Toluene Sulfonic Acid Intercalation Compound by Melting Method |
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| Zhao Shunping,Wang Tao,Xu Heng,Guo Yu. Preparation of Kaolinite/p-Toluene Sulfonic Acid Intercalation Compound by Melting Method[J]. Non-metallic Mines, 2009, 32(4) |
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| Authors: | Zhao Shunping Wang Tao Xu Heng Guo Yu |
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| Affiliation: | Zhao Shunping1,2 Wang Tao1,2 Xu Heng1,2 Guo Yu3(1 School of Chemistry and Chemical Engineering,Anqing Teachers college,Anqing 246011,2 Anhui Province Key Laboratory of Light,Electricity,Magnetic Functional Complexes and Nano-complexes,3 School of Physics and Electrical Engineering,Anqing 246011) |
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| Abstract: | The kaolinite/p-toluene sulfonic acid(K/p-TSA) intercalation compound was prepared by the melting method with the kaolinite/dimethyl sulphoxide(K/DMSO) as intercalation precursor.The intercalation compound was characterized by the X-ray diffraction(XRD),Fourier transform infrared spectrometer(FT-IR),Simultaneous TG-DSC Apparatus.The results showed that the spacings of layers of the K/p-TSA intercalation compound reacted for 12h were about 1.014nm,1.088nm,1.263nm,1.378nm,the intercalation ratio reached 89.7%... |
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| Keywords: | kaolinite p-toluene sulfonic acid(p-TSA) intercalated melting method |
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