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溶胶凝胶法制备钼掺杂氧化锌薄膜及性质研究
引用本文:邵景珍,董伟伟,陶汝华,邓赞红,周曙,方晓东.溶胶凝胶法制备钼掺杂氧化锌薄膜及性质研究[J].量子电子学报,2011,28(2):247-252.
作者姓名:邵景珍  董伟伟  陶汝华  邓赞红  周曙  方晓东
作者单位:1 中国科学院安徽光学精密机械研究所,安徽省光子器件与材料重点实验室,安徽 合肥 230031; 2 中国科学院新型薄膜太阳能电池重点实验室,安徽 合肥 230031
基金项目:Anhui Provincial Natural Science Foundation(090414169);Anhui Provincial International Science and Technology Cooperation Program(10080703021)
摘    要:利用溶胶凝胶法在Al2O 3衬底上制备出了c轴择优取向的钼掺杂氧化锌(MZO)透明导电薄膜,研究了钼的掺杂量(0~1 at%)对钼掺杂氧化锌薄膜光电性能的影响。研究结果表明:所制备的薄膜为六方纤锌矿型结构且表面平整、致密,通过高温真空退火,MZO薄膜的电阻率明显降低,且随着钼含量的增加,MZO薄膜的电阻率呈现出先减小后增大的趋势,当钼含量为0.4at.%时,获得最小电阻率为0.13 Ωcm。薄膜在近红外区域(800~2000 nm)的平均透过率大于85%,这可以有效地拓宽光电器件的光谱范围。

关 键 词:材料  光电特性  溶胶凝胶法  钼掺杂氧化锌  透明导电氧化物

Characterization of Mo-doped ZnO thin films prepared by sol-gel method
SHAO Jing-zhen,DONG Wei-wei,TAO Ru-hua,DENG Zan-hong,ZHOU Shu,FANG Xiao-dong.Characterization of Mo-doped ZnO thin films prepared by sol-gel method[J].Chinese Journal of Quantum Electronics,2011,28(2):247-252.
Authors:SHAO Jing-zhen  DONG Wei-wei  TAO Ru-hua  DENG Zan-hong  ZHOU Shu  FANG Xiao-dong
Affiliation:1 Anhui Provincial Key Laboratory of Photonic Devices and Materials, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031, China;  2 Key Laboratory of New Thin Film Solar Cells, Institue of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China)
Abstract:Mo-doped ZnO (MZO) films with different Mo concentration (0~1 at%) were prepared on Al2O3(0001) substrates by sol-gel spin coating route. It was found that the MZO films with ZnO hexagonal wurtzite structure were highly c-axis orientation. The electrical properties of MZO films can be significantly improved by the heat-treatment in vacuum. The resistivity of the films initially decreases with the increase of Mocontent and then gradually increases with a further increase of Mo content. The lowest resistivity of 0.13 Ωcm was obtained at a Mo content of 0.4 at%. The carrier concentration and Hall mobility were measured and discussed to understand the electrical transport characteristics. The high average transmittance (>85%)in near-infrared region (800~2000 nm) indicates the possible use of MZO films in photoelectric device can widen absorption spectrum range.
Keywords:materials  photoelectric properties  sol-gel spin coating method  Mo-doped zinc oxide  transparent conducting oxides
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