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Swift heavy ion irradiation induced texturing in NiO thin films |
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| Authors: | P. Mallick Chandana Rath D. Behera D. Kanjilal N.C. Mishra |
| Affiliation: | a Department of Physics, North Orissa University, Baripada 757 003, India b Department of Physics, R.B.S. College, Agra 282 002, India c School of Material Science & Technology, Institute of Technology, BHU, Varanasi 221 005, India d Department of Physics, Utkal University, Bhubaneswar, Orissa 751 004, India e Department of Physics, NIT, Rourkela 769 008, India f Inter-University Accelerator Center, P.O. Box 10502, New Delhi 110 067, India g Institute of Physics, Bhubaneswar 751005, India |
| Abstract: | NiO thin films grown on Si(1 0 0) substrate by electron beam evaporation and sintered at 500 and 700 °C were irradiated with 120 MeV Au9+ ions. The FCC structure of the sintered films was retained up to the highest fluence (3 × 1013 ions cm−2) of irradiation. In the low fluence (?1 × 1013 ions cm−2) regime however, the evolution of the XRD pattern with fluence showed a wide variation, critically depending upon their initial microstructure. Though irradiation is known to induce disorder in the structure, we observe improvement in crystallization and texturing at intermediate fluences of irradiation. |
| Keywords: | 61.80.Jh 61.82.Rx 61.85.+p 61.82.Ms 68.55.Ac 68.55.jm |
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