Simultaneous structure and elastic wave velocity measurement of SiO2 glass at high pressures and high temperatures in a Paris-Edinburgh cell

An integration of multi-angle energy-dispersive x-ray diffraction and ultrasonic elastic wave velocity measurements in a Paris-Edinburgh cell enabled us to simultaneously investigate the structures and elastic wave velocities of amorphous materials at high pressure and high temperature conditions. We report the first simultaneous structure and elastic wave velocity measurement for SiO(2) glass at pressures up to 6.8 GPa at around 500°C. The first sharp diffraction peak (FSDP) in the structure factor S(Q) evidently shifted to higher Q with increasing pressure, reflecting the shrinking of intermediate-range order, while the Si-O bond distance was almost unchanged up to 6.8 GPa. In correlation with the shift of FSDP position, compressional wave velocity (Vp) and Poisson's ratio increased markedly with increasing pressure. In contrast, shear wave velocity (Vs) changed only at pressures below 4 GPa, and then remained unchanged at ~4.0-6.8 GPa. These observations indicate a strong correlation between the intermediate range order variations and Vp or Poisson's ratio, but a complicated behavior for Vs. The result demonstrates a new capability of simultaneous measurement of structures and elastic wave velocities at high pressure and high temperature conditions to provide direct link between microscopic structure and macroscopic elastic properties of amorphous materials.