| 碳钢基体磁控溅射SiC薄膜结合力研究 |
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| 引用本文： | 邵红红,张晔,高建昌,华戟云.碳钢基体磁控溅射SiC薄膜结合力研究[J].金属热处理,2007,32(2):50-53. |
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| 作者姓名： | 邵红红 张晔 高建昌 华戟云 |
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| 作者单位： | 江苏大学,材料科学与工程学院,江苏,镇江,212013 |
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| 摘 要： | 采用磁控溅射法在T10钢表面获得了SiC薄膜,并研究了溅射方式、工艺参数以及中间层对薄膜结合性能的影响.试验结果表明,采用功率为200 W射频法和时间为2 h的SiC/Ni-P双层薄膜结合力最好.
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| 关 键 词： | 磁控溅射 SiC薄膜 结合力 Ni-P合金中间层 钢基体 磁控溅射法 膜结合力 研究 Carbon Steel Magnetron Sputtering SiC Films Force 时间 射频法 功率 结果 试验 影响 结合性能 中间层 工艺参数 薄膜 钢表面 |
| 文章编号： | 0254-6051（2007）02-0050-04 |
| 修稿时间： | 2006-10-06 |
Binding Force of SiC Films Prepared by Magnetron Sputtering on Carbon Steel |
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| SHAO Hong-hong,ZHANG Ye,GAO Jian-chang,HUA Ji-yun.Binding Force of SiC Films Prepared by Magnetron Sputtering on Carbon Steel[J].Heat Treatment of Metals,2007,32(2):50-53. |
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| Authors: | SHAO Hong-hong ZHANG Ye GAO Jian-chang HUA Ji-yun |
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| Affiliation: | School of Materials Science and Technology, Jiangsu University, Zhenjiang Jiangsu 212013, China |
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| Abstract: | SiC films on T10 steel surface were prepared by magnetron sputtering method. Influence of the sputtering methods, processing parameters and interlayer on the binding force of the films were investigated. The experiment results indicate that the SiC/Ni-P films prepared by RF magnetron sputtering with power of 200 W and time of 2 h have the best binding force. |
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| Keywords: | magnetron sputtering SiC films binding force Ni-P alloy interlayer |
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