Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by the combined high-power impulse magnetron sputtering/unbalanced magnetron sputtering (HIPIMS/UBM) technology |
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Authors: | P Eh Hovsepian AP Ehiasarian C Schimpf |
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Affiliation: | a Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Howard Street, Sheffield S1 1WB, UK b Hydra Clarkson International, P.O. Box 37, Sheffield S6 3AH, UK c Faculty for Materials Science and Materials Technology, Technical University of Mining and Technology, Freiberg, Germany |
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Abstract: | A new TiAlCN/VCN coating combining high hardness, low friction coefficient and chemical inertness has been developed for dry machining of “Sticky” (Al-, Ti- and Ni-based) alloys as well as advanced Metal-Matrix-Composite (MMC) materials used in aerospace and automotive industries. Excellent performance was achieved due to the synergy between V and C as main coating elements and the nanoscale multilayer structure of the coating. TiAlCN/VCN was deposited by the combined High-Power Impulse Magnetron Sputtering/Unbalanced Magnetron sputtering (HIPIMS/UBM) technology. Macroparticle free V+ ion flux generated by HIPIMS discharge was used to sputter clean the substrates prior to the coating deposition. A 0.4 μm thick TiAlN base layer followed by 3 μm thick TiAlCN/VCN nanoscale multilayer coating was deposited by unbalanced magnetron sputtering. The sputtering was carried out in a mixed CH4, N2 and Ar atmosphere. In dry milling of Al7010-T7651 alloy, TiAlCN/VCN nanoscale multilayer PVD coating outperformed state of the art Diamond Like Carbon (DLC, Cr/WC/a-CH) coating by factor of 4. In drilling Al-alloy enforced MMC materials, cemented carbide drills coated with TiAlCN/VCN produced 130 holes compared to 1-2 holes with uncoated drills. |
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Keywords: | Magnetron sputtering Nanoscale multilayer structure Aluminium alloys Dry machining |
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