Experimental high performance sub-0.1 μm channel nMOSFET's |
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Authors: | Mii Y Rishton S Taur Y Kern D Lii T Lee K Jenkins KA Quinlan D Brown T Jr Danner D Sewell F Polcari M |
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Affiliation: | IBM Thomas J. Watson Res. Center, Yorktown Heights, NY; |
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Abstract: | Very high performance sub-0.1 μm channel nMOSFET's are fabricated with 35 Å gate oxide and shallow source-drain extensions. An 8.8-ps/stage delay at Vdd=1.5 V is recorded from a 0.08 μm channel nMOS ring oscillator at 85 K. The room temperature delay is 11.3 ps/stage. These are the fastest switching speeds reported to date for any silicon devices at these temperatures. Cutoff frequencies (fT) of a 0.08 μm channel device are 93 GHz at 300 K, and 119 GHz at 85 K, respectively. Record saturation transconductances, 740 mS/mm at 300 K and 1040 mS/mm at 85 K, are obtained from a 0.05 μm channel device. Good subthreshold characteristics are achieved for 0.09 μm channel devices with a source-drain halo process |
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