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| 化学增幅型光致抗蚀剂用光产酸剂 | |
| 引用本文： | 孟磊,刘玉芹,王金铃,徐娜.化学增幅型光致抗蚀剂用光产酸剂[J].吉林化工学院学报,2012,29(11):45-47. |
| 作者姓名： | 孟磊 刘玉芹 王金铃 徐娜 |
| 作者单位： | 1. 吉林化工学院材料科学与工程研究中心,吉林吉林,132022 2. 中国石油吉林石化公司乙烯厂,吉林吉林,132022 3. 吉林市龙潭区第二实验幼儿园,吉林吉林,132021 4. 吉林化工学院研究生处,吉林吉林,132022 |
| 摘 要： | 综述了用于化学增幅型光致抗蚀剂的光产酸剂及机理,对于几种常用的离子型和非离子型光产酸剂分别进行了阐述,并对其特性和应用做了简单介绍. |
| 关 键 词： | 化学增幅 光致抗蚀剂 光产酸剂 |
Photoacid gGnerators for Chemically Amplified Photoresists |
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| MENG Lei,LIU Yu-qin,WANG Jin-ling,XU Na.Photoacid gGnerators for Chemically Amplified Photoresists[J].Journal of Jilin Institute of Chemical Technology,2012,29(11):45-47. | |
| Authors: | MENG Lei LIU Yu-qin WANG Jin-ling XU Na |
| Affiliation: | (4*) (1.Materials Science and Engineering Research Center,Jilin Institute of Chemical Technology,Jilin City 132022,China;2.CNPC Jilin petrochemical company ethylene plant,Jilin City 132022,China;3.Second Experimental Kindergarten of Longtan District, Jilin City 132022,China;4.Postgraduate Department Office,Jilin Institute of Chemical Technology,Jilin City 132022,China) |
| Abstract: | Various kinds of photoacid generators for chemically amplified photoresists and their reaction mechanism of acid amplification are reviewed.The characteristics and application of these materials are also introduced. |
| Keywords: | chemically amplify photoresists photoacid generators |
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