电子束光刻中的内部邻近效应校正技术研究

研究了基于图形几何尺寸修正的电子束光刻的内部邻近效应校正技术,利用累积分布函数预先进行内部最大矩形和顶点矩形的快速计算,并把它们存储在矩阵中。在校正过程中,根据初始矩形的尺寸,通过访问矩阵实现内部最大矩形和顶点矩形的快速替换。矩阵的预先建立,最大限度地减小了校正过程中的计算强度。模拟结果表明,通过内部最大矩形和顶点矩形的替换,能够快速地实现内部邻近效应校正,校正时间与被校正图形数目成线性关系增加。在与同类软件精度相同的情况下,提高了运算速度。

Study of Internal Proximity Effect Correction in Electron-Beam Lithograph

The internal proximity effect correction in the electron beam lithography based on the variation of the pattern shape was studied.The inner maximal rectangles(IMR) and the vertex rectangles(VR) were calculated rapidly by the CDF function in advance,and were saved into the matrix.During the process of the correction,the primitive rectangles were replaced by the IMR and the VR through looking up matrix according to the size of the primitive rectangles.The construction of the matrix in advance minimizes the ca...