复合离子液体中恒电流电沉积制备Ir层研究

对BMIC+BMIBF4复合离子液体中利用恒电流电沉积的方法在Mo基体上制备Ir层进行了研究。利用扫描电子显微镜(SEM)和X射线光电子能谱仪(XPS)对Ir层的表面形貌和成分进行了分析。结果表明:在BMIC+BMIBF4+EG复合体系中可以电沉积制备平整致密的单质Ir层且影响因素较多,如温度、电流密度、主盐浓度及沉积时间等,且这些因素可调节的范围比较窄。通过对比各因素间的影响得出,在此复合体系中恒电流电沉积制备Ir层的优化工艺为Ir Cl3浓度50 g/L,电流密度1.0 m A/cm2,沉积温度90℃,沉积时间20 h。

Preparation of Iridium Layers by Galvanostatic Electrodeposition in

Iridium layers were electrodeposited on molybdenum substrates by galvanostatic electrodeposition in BMIC+BMIBF4 composited ionic liquid. The surface morphologies and compositions of iridium layers were characterized by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Results show that the concentration of IrCl3, current density, temperature and duration of electrodeposition all influence the preparation of iridium layers in BMIC+BMIBF4+EG composited system, and the technique ranges in which we can get iridium layers are narrow. Through comparing the influence of these factors, the best condition to obtain iridium layers in BMIC+BMIBF4+EG composited system is found, i.e. the deposition temperature 90 oC, current density 1.0 mA/cm2, the concentration of IrCl3 50 g/L and the duration of deposition 20 h.